Optical properties and electrical properties of heavily Al-doped ZnSe layers

被引:1
|
作者
Oh, D. C. [1 ,5 ]
Takai, T. [1 ]
Im, I. H. [1 ]
Park, S. H. [1 ]
Hanada, T. [1 ]
Yao, T. [1 ,6 ]
Song, J. S. [2 ]
Chang, J. H. [3 ]
Makino, H. [4 ]
Han, C. S. [5 ]
Koo, K. H. [5 ]
机构
[1] Tohoku Univ, Mat Res Inst, Aoba Ku, Sendai, Miyagi 9808577, Japan
[2] NeosemiTech Corp, Seo Ku, Inchon 404310, South Korea
[3] Korea Maritime Univ, Dept Semicond Phys, Youngdo Ku, Pusan 606791, South Korea
[4] Kochi Univ Technol, Res Inst, Mat Design Ctr, Kochi 7828502, Japan
[5] Hoseo Univ, Dept Def Sci & Technol, Asan 336795, Asan, South Korea
[6] Tohoku Univ, Interdisciplinary Res Ctr, Aoba Ku, Sendai, Miyagi 9808578, Japan
来源
基金
新加坡国家研究基金会;
关键词
D O I
10.1116/1.2836404
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
We have investigated optical properties and electrical properties of electrically degraded ZnSe layers by heavy Al doping, where their electron concentrations lie in the range of 7 X 10(17)-6 X 10(18) cm(-3). Low-temperature photoluminescence exhibits two dominant radiative trap centers of 1.97 eV (RDI) and 2.25 eV (RD2), which are ascribed to V-zn-related complex defects. Deep-level-transient spectroscopy shows two electron-trap centers at 0.16 eV (ND1) and 0.80 eV (ND2) below the conduction-band minimum. On the other hand, it is found that RD2 is dominant in relatively lightly doped ZnSe:Al layers below 7 X 10(18) cm(-3) and RD1 is dominant in more heavily doped layers near 1 X 10(19) cm(-3), while ND1 and ND2 are independent of A1 doping concentration and their trap densities are estimated be below 3 X 10(16) cm(-3). This indicates that RD1 and RD2 cause the carrier compensation in heavily doped ZnSe:Al layers. Their electron transport mechanism can be explained by ionized-impurity scattering mechanism. (C) 2008 American, Vacuum Society.
引用
收藏
页码:259 / 264
页数:6
相关论文
共 50 条
  • [1] Electrical properties of heavily Al-doped ZnSe grown by molecular beam epitaxy
    Oh, DC
    Chang, JH
    Takai, T
    Song, JS
    Godo, K
    Park, YK
    Shindo, K
    Yao, T
    JOURNAL OF CRYSTAL GROWTH, 2003, 251 (1-4) : 607 - 611
  • [2] Structural, Optical, Dielectric and Electrical Properties of Al-Doped ZnSe Thin Films
    T. S. Kayed
    A. F. Qasrawi
    Khaled A. Elsayed
    Journal of Electronic Materials, 2019, 48 : 3519 - 3526
  • [3] Structural, Optical, Dielectric and Electrical Properties of Al-Doped ZnSe Thin Films
    Kayed, T. S.
    Qasrawi, A. F.
    Elsayed, Khaled A.
    JOURNAL OF ELECTRONIC MATERIALS, 2019, 48 (06) : 3519 - 3526
  • [4] ELECTRICAL AND LUMINESCENCE PROPERTIES OF AL-DOPED AND MN-DOPED ZNSE
    KUZHELEV, LP
    MIRONOV, IA
    RYZHKIN, YS
    STROGANOVA, IM
    USPENSKAYA, EM
    INORGANIC MATERIALS, 1976, 12 (03) : 344 - 347
  • [5] Investigation of the optical properties of Al-doped Ag Layers
    Mariegaard, Elisabeth
    Stovring, Ida Skot
    Lavrinenko, Andrei
    Malureanu, Radu
    2021 CONFERENCE ON LASERS AND ELECTRO-OPTICS EUROPE & EUROPEAN QUANTUM ELECTRONICS CONFERENCE (CLEO/EUROPE-EQEC), 2021,
  • [6] Preparation and optical–electrical properties of Al-doped ZnO films
    Qiuyue Fu
    Sue Hao
    Bin Shen
    Xiangbin Duan
    Haichen Na
    Research on Chemical Intermediates, 2013, 39 : 527 - 536
  • [7] Electrical and optical properties of Al-doped ITO thin films
    Kim, Yong-Gi
    Ryu, Sung-Won
    Kim, Deok-Soo
    Rhee, Byung-Roh
    Kim, Jong-Jae
    Hong, Woo-Pyo
    Kim, Haw-Min
    Park, Seoung-Hwan
    JOURNAL OF THE KOREAN PHYSICAL SOCIETY, 2008, 53 (03) : 1722 - 1725
  • [8] STUDY OF SOME OPTICAL AND ELECTRICAL-PROPERTIES OF HEAVILY DOPED SILICON LAYERS
    SLAOUI, A
    FOGARASSY, E
    MULLER, JC
    SIFFERT, P
    JOURNAL DE PHYSIQUE, 1983, 44 (NC-5): : 65 - 71
  • [9] Correlation of structural, electrical and optical properties of Al-doped ZnO TCOs
    Rajan Singh
    S. K. Mukherjee
    Journal of Materials Science: Materials in Electronics, 2022, 33 : 6969 - 6980
  • [10] Correlation of structural, electrical and optical properties of Al-doped ZnO TCOs
    Singh, Rajan
    Mukherjee, S. K.
    JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS, 2022, 33 (09) : 6969 - 6980