Infuence of crystallinity on the bulk laser-induced damage threshold and absorption of laser light in CsLiB6O10 crystals

被引:20
|
作者
Kamimura, T [1 ]
Ono, R [1 ]
Yap, YK [1 ]
Yoshimura, M [1 ]
Mori, Y [1 ]
Sasaki, T [1 ]
机构
[1] Osaka Univ, Dept Elect Engn, Suita, Osaka 5650871, Japan
关键词
CsLiB6O10 (CLBO); crystallinity; bulk laser-induced damage threshold; dislocation density; absorption of laser light;
D O I
10.1143/JJAP.40.L111
中图分类号
O59 [应用物理学];
学科分类号
摘要
The relationships among the bulk laser-induced damage threshold (LIDT), dislocation density and absorption of laser light in CsLiB6O10 (CLBO) were investigated. A newly developed synthesis process allows the growth of CLBO crystals with a LIDT of 2.5-fold higher than that grown by the conventional top-seeded solution growth (TSSG) technique. High-quality CLBO possesses lower dislocation density (6.6 x 10(3)/cm(2)) than conventional CLBO (similar to 15.0 x 10(3)/cm(2)). The absorption of laser light in CLBO was characterized by measuring the temperature increase on the crystal output surface during the generation of fourth-harmonic (@266 nm) light of Nd:YAG lasers. At a UV power of 5 W, the maximum temperature increase was 6 degreesC for high-quality CLBO, which was similar to 30% lower than that generated on conventional CLBO crystal. Thus, the reduction of dislocation density can suppress the absorption of laser light, which helps to enhance the resistance of CLBO against laser induced damage and alleviate thermal dephasing during the high-power generation of UV light.
引用
收藏
页码:L111 / L113
页数:3
相关论文
共 50 条
  • [31] Investigation of bulk laser damage threshold and UV absorption on crystallinity in CLBO crystal
    Kamimura, T
    Ono, R
    Fukumoto, S
    Yap, YK
    Yoshimura, M
    Mori, Y
    Sasaki, T
    Tanaka, M
    Okada, Y
    CLEO(R)/PACIFIC RIM 2001, VOL II, TECHNICAL DIGEST, 2001, : 214 - 215
  • [32] Enhancement of CsLiB6O10 surface-damage resistance by improved crystallinity and ion-beam etching
    Kamimura, T
    Fukumoto, S
    Ono, R
    Yap, YK
    Yoshimura, M
    Mori, Y
    Sasaki, T
    Yoshida, K
    OPTICS LETTERS, 2002, 27 (08) : 616 - 618
  • [33] Effect of ultra-short pulse laser for second harmonic generation in CsLiB6O10
    Wang Li
    Han Xiuyou
    ADVANCED LASER TECHNOLOGIES 2005, PTS 1 AND 2, 2006, 6344
  • [34] Large aperture CsLiB6O10 frequency doubler for high energy Nd:glass laser
    Kiriyama, H
    Inoue, N
    Yamakawa, K
    HIGH-POWER LASERS AND APPLICATIONS II, 2002, 4914 : 6 - 13
  • [35] High energy second-harmonic generation of Nd:glass laser radiation with large aperture CsLiB6O10 crystals
    Kiriyama, H
    Inoue, N
    Yamakawa, K
    OPTICS EXPRESS, 2002, 10 (19): : 1028 - 1032
  • [36] CsLiB6O10 crystal:: forth and fifth-harmonic generation in Nd:YAP laser
    Kokh, AE
    Kononova, NG
    Lisova, IA
    Muraviov, SV
    GROWTH, FABRICATION, DEVICES, AND APPLICATIONS OF LASER AND NONLINEAR MATERIALS, 2001, 4268 : 43 - 48
  • [37] Full characterization of third harmonic generation in CsLiB6O10 (CLBO) crystals
    Kim, MS
    Yoon, CS
    CLEO(R)/PACIFIC RIM 2001, VOL II, TECHNICAL DIGEST, 2001, : 398 - 399
  • [38] Tunable ultraviolet laser source based on solid-state dye laser technology and CsLiB6O10 harmonic generation
    Science Applications Int Corp, McLean, United States
    Opt Lett, 4 (209-211):
  • [39] THERMAL EXPANSION OF THE LiKB4O7 AND CsLiB6O10 SINGLE CRYSTALS
    Adamiv, V. T.
    Burak, Ya. V.
    Girnyk, I. S.
    Teslyuk, I. M.
    UKRAINIAN JOURNAL OF PHYSICS, 2006, 51 (07): : 686 - 691
  • [40] Effect of RF plasma etching on surface damage in CsLiB6O10 crystal
    Kamimura, T
    Yoshimura, M
    Mori, Y
    Sasaki, T
    Yoshida, K
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1999, 38 (2B): : L181 - L183