Growth of vertically aligned carbon nanotube emitters on patterned silicon trenches for field emission applications

被引:21
|
作者
Huh, Y
Lee, JY
Lee, CJ
机构
[1] Korea Adv Inst Sci & Technol, Dept Mat Sci & Engn, Taejon 305701, South Korea
[2] Sungkyunkwan Univ, Ctr Adv Plasma Surface Technol, Suwon 440746, South Korea
[3] Hanyang Univ, Dept Nanotechnol, Seoul 133791, South Korea
关键词
carbon nanotube; patterned trench; field emission; aligned growth; thermal chemical vapor deposition;
D O I
10.1016/j.tsf.2004.08.049
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We have synthesized vertically aligned carbon nanotube (CNT) emitters on iron-deposited trenches by thermal chemical vapor deposition of acetylene gas for field emission applications. The trenches patterned with various shapes and sizes were fabricated on silicon oxide/silicon substrates using a conventional lithography method and lift-off process. The vertically well-aligned carbon nanotubes were selectively grown only on iron-deposited trenches. The alignment, selectivity, and structure of carbon nanotube emitters grown on the patterned silicon trenches with various shapes and sizes are investigated. Field emission properties such as turn-on voltage and the emission current are also characterized. (C) 2004 Elsevier B.V. All rights reserved.
引用
收藏
页码:267 / 270
页数:4
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