Morphological changes of electron-beam irradiated PMMA surface

被引：0

作者：

Nathawat, Rashi ^{[1
]}

Kumar, Anil ^{[1
]}

Vijay, Y. K. ^{[1
]}

机构：

[1] Univ Rajasthan, Dept Phys, Jaipur 302004, Rajasthan, India

来源：

2007 IEEE PARTICLE ACCELERATOR CONFERENCE, VOLS 1-11 | 2007年

关键词：

D O I：

暂无

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Atomic Force Microscopy (AFM) study of low energy (10keV) electron beam irradiated Polymethylmethacrylate (PMMA) surface was performed. PMMA thin film of (20 mu m), were used in lithography technique. AFM in tapping mode has been utilized to investigate the morphological changes on the surfaces of sample as a function of fluence. TM-AFM showed the hills of the nano size surrounded by crater type features in all irradiated samples. The Root-Mean-Square (rms) surface roughness of the samples changed from 2.666 nm to 5.617 nm with fluence from 2 x 10(14)e/cm(2) to 1x10(16)e/cm(2). It shows that roughness increases with fluence.

引用

页码：1989 / 1991

页数：3

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