Dynamic reaction cell ICPMS for trace metal analysis of semiconductor materials

被引：11
|
作者：
Kawabata, K
Kishi, Y
Thomas, R
机构：
来源：
ANALYTICAL CHEMISTRY | 2003年 / 75卷 / 19期
关键词：
D O I：
10.1021/ac0313926
中图分类号：
O65 [分析化学];
学科分类号：
070302 ; 081704 ;
摘要：
The need for lower detection levels in the semiconductor industry poses one of the greatest challenges to ICPMS.
引用
收藏
页码：422A / 428A
页数：7
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