Optimized materials properties for organosilicate glasses produced by plasma-enhanced chemical vapor deposition

被引：0

作者：

O'Neill, ML ^{[1
]}

Vrtis, RN ^{[1
]}

Vincent, JL ^{[1
]}

Lukas, AS ^{[1
]}

Karwacki, EJ ^{[1
]}

Peterson, BK ^{[1
]}

Bitner, MD ^{[1
]}

机构：

[1] Air Prod & Chem Inc, Allentown, PA 18195 USA

来源：

MATERIALS, TECHNOLOGY AND RELIABILITY FOR ADVANCED INTERCONNECTS AND LOW-K DIELECTRICS-2003 | 2003年 / 766卷

关键词：

D O I：

暂无

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

In this paper we examine the relationship between precursor structure and material properties for films produced from several leading organosilicon precursors on a common processing platform. Results from our study indicate that for the precursors tested the nature of the precursor has little effect upon film composition but significant impact on film structure and properties.

引用

页码：321 / 326

页数：6

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