Phase-controlled entanglement in a quantum-beat laser: application to quantum lithography

被引：9
|
作者：
Sete, Eyob A. [1 ,2 ]
Dorfman, Konstantin E. [1 ,2 ]
Dowling, Jonathan P. [3 ,4 ]
机构：
[1] Texas A&M Univ, Inst Quantum Sci & Engn, College Stn, TX 77843 USA
[2] Texas A&M Univ, Dept Phys & Astron, College Stn, TX 77843 USA
[3] Louisiana State Univ, Hearne Inst Theoret Phys, Baton Rouge, LA 70803 USA
[4] Louisiana State Univ, Dept Phys & Astron, Baton Rouge, LA 70803 USA
来源：
JOURNAL OF PHYSICS B-ATOMIC MOLECULAR AND OPTICAL PHYSICS | 2011年 / 44卷 / 22期
基金：
美国国家科学基金会;
关键词：
INTERFEROMETRIC OPTICAL LITHOGRAPHY; CONTINUOUS VARIABLE SYSTEMS; EXPLOITING ENTANGLEMENT; DIFFRACTION LIMIT; BELL INEQUALITIES; CASCADE LASER; SINGLE-PHOTON; ATOM; INTERFERENCE; ABSORPTION;
D O I：
10.1088/0953-4075/44/22/225504
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
We study entanglement generation and control in a quantum-beat laser coupled to a two-mode squeezed vacuum reservoir. We show that the generated entanglement is robust against cavity losses and environmental decoherence and can be controlled by tuning the phases of the microwave and the squeezed input fields. Moreover, we discuss two-photon correlations, absorption and implementations in quantum optical lithography.
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页数：7
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