Behavior of hydrogen in excimer laser annealing of hydrogen-modulation-doped amorphous silicon layer

被引：6
|
作者：
Heya, Akira [1 ]
Serikawa, Tadashi [2 ]
Kawamoto, Naoya [3 ]
Matsuo, Naoto
机构：
[1] Univ Hyogo, Himeji, Hyogo 6712280, Japan
[2] Osaka Univ, Osaka 5670047, Japan
[3] Yamaguchi Univ, Ube, Yamaguchi 7558611, Japan
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS | 2008年 / 47卷 / 03期
关键词：
excimer laser annealing; hydrogen-modulation-doped amorphous silicon; nucleation; recombination energy; polycrystalline silicon;
D O I：
10.1143/JJAP.47.1853
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
A novel crystallization method for a low-temperature process is proposed, called "excimer laser annealing (ELA) of amorphous silicon (a-Si) with a hydrogen (H) modulation-doped layer" (ELHMD). The effects of H on low-energy crystallization by conventional ELA and ELHMD were investigated. The properties of polycrystalline silicon (poly-Si) film were changed by adjusting the H concentration and H distribution in the a-Si film for low-laser-energy irradiation. The recombination energy of H from the SiH2 bond enhances crystal nucleation during Si melting. Film exfoliation caused by H-2 bursts can be suppressed and high-quality crystal grains are obtained by ELHMD.
引用
收藏
页码：1853 / 1857
页数：5
相关论文
共 50 条
  • [1] Excimer laser annealing of hydrogen modulation doped a-Si film
    Heya, Akira
    Matsuo, Naoto
    Serikawa, Tadashi
    Kawarno, Naoya
    JOURNAL OF THE JAPAN INSTITUTE OF METALS, 2007, 71 (08) : 661 - 665
  • [2] Excimer laser annealing of hydrogen modulation doped a-Si film
    Heya, Akira
    Matsuo, Naoto
    Serikawa, Tadashi
    Kawamoto, Naoya
    MATERIALS TRANSACTIONS, 2007, 48 (05) : 975 - 979
  • [3] Role of hydrogen in excimer laser annealing of hydrogen-modulation doped a-Si film
    Heya, Akira
    Matsuo, Naoto
    Serikawa, Tadashi
    Kawamoto, Naoya
    SOLID-STATE ELECTRONICS, 2008, 52 (03) : 381 - 387
  • [4] Single shot excimer laser annealing of amorphous silicon: Effect of hydrogen on the properties of the polysilicon
    Boher, P
    Stehle, M
    Godard, B
    Stehle, JL
    ADVANCED LASER PROCESSING OF MATERIALS - FUNDAMENTALS AND APPLICATIONS, 1996, 397 : 417 - 422
  • [5] Hydrogen modulation-doped structures to improve crystalline fraction of polycrystalline silicon films prepared by excimer laser annealing at low energy densities
    Heya, Akira
    Matsuo, Naoto
    Serikawa, Tadashi
    Kawamoto, Naoya
    Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 2007, 46 (12): : 7858 - 7860
  • [6] Hydrogen modulation-doped structures to improve crystalline fraction of polycrystalline silicon films prepared by excimer laser annealing at low energy densities
    Heya, Akira
    Matsuo, Naoto
    Serikawa, Tadashi
    Kawamoto, Naoya
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2007, 46 (12): : 7858 - 7860
  • [7] Grain enlargement of polycrystalline silicon by multipulse excimer laser annealing: Role of hydrogen
    Kawamoto, Naoya
    Masuda, Atsushi
    Matsuo, Naoto
    Seri, Yasuhiro
    Nishimori, Toshimasa
    Kitamon, Yoshitaka
    Matsumura, Hideki
    Hamada, Hiroki
    Miyoshi, Tadaki
    Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 2006, 45 (4 A): : 2726 - 2730
  • [8] Grain enlargement of polycrystalline silicon by multipulse excimer laser annealing: Role of hydrogen
    Kawamoto, N
    Masuda, A
    Matsuo, N
    Seri, Y
    Nishimori, T
    Kitamon, Y
    Matsumura, H
    Hamada, H
    Miyoshi, T
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2006, 45 (4A): : 2726 - 2730
  • [9] THERMAL ANNEALING BEHAVIOR OF HYDROGEN FREE AMORPHOUS-SILICON AND GERMANIUM
    HUBLER, GK
    DONOVAN, EP
    WANG, KW
    SPITZER, WG
    PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS, 1985, 530 : 222 - 229
  • [10] Excimer laser annealing of hydrogen modulation doping a-Si film for flexible display
    Heya, A.
    Serikawa, T.
    Kawamoto, N.
    Matsuo, N.
    IDW '06: PROCEEDINGS OF THE 13TH INTERNATIONAL DISPLAY WORKSHOPS, VOLS 1-3, 2006, : 801 - +
12345