Near cathode optical emission spectroscopy in N2-H2 glow discharge plasma

被引:32
|
作者
Suraj, K. S.
Bharathi, P.
Prahlad, V.
Mukhe, S.
机构
[1] GIDC, FCIPT, Gandhinagar 382044, Gujarat, India
[2] Inst Plasma Res, Bhat 382428, Gandhinagar, India
来源
SURFACE & COATINGS TECHNOLOGY | 2007年 / 202卷 / 02期
关键词
optical emission spectroscopy; spectral intensity; adsorption; cathode sheath; plasma nitriding;
D O I
10.1016/j.surfcoat.2007.05.063
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Optical emission spectroscopy (OES) is a non-intrusive diagnostic technique, widely used to study different kinds of plasmas. In the present work, a locally resolved OES technique was used to obtain near cathode (substrate) emission spectra for N-2-H-2 glow discharges. It was observed that, along with N-2(+) and N-2 lines, the characteristic atomic nitrogen lines at 742.3 nm (3p S-4(3/2) (0)-> 3s P-4(3/2)), 746.8 mn (3 p S-4(3/2) (0)-> 3s P-4(5/2)) and H-alpha (656.3 nm) were the main emissions coming from the sheath region that shrouded the cathode. A qualitative analysis of the spectral lines near the cathode has been done in order to understand the mechanism of plasma nitriding and the role played by the hydrogen in the nitriding process. The decrease in local intensity of these atomic lines with hydrogen composition suggests that the effect of hydrogen is to enhance the sticking/adsorption of N on the cathode surface. (c) 2007 Elsevier B.V All rights reserved.
引用
收藏
页码:301 / 309
页数:9
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