Electron-beam lithography

被引：0

作者：

Harriott, L

Liddle, A

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暂无

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

引用

页码：41 / 45

页数：5

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[J]. SOLID STATE TECHNOLOGY, 1989, 32 (03) : 69 - 72
[22] RESIST CHARGING IN ELECTRON-BEAM LITHOGRAPHY
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[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1995, 13 (05): : 1979 - 1983
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[J]. PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS, 1984, 471 : 2 - 7
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[J]. POLYMER ENGINEERING AND SCIENCE, 1980, 20 (16): : 1110 - 1114
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[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (06): : 1814 - 1814
[28] ON DOSE CORRECTION IN ELECTRON-BEAM LITHOGRAPHY
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[J]. JOURNAL OF APPLIED PHYSICS, 1988, 64 (01) : 421 - 423
[29] RESIST MATERIALS FOR ELECTRON-BEAM LITHOGRAPHY
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[J]. JOURNAL OF IMAGING TECHNOLOGY, 1985, 11 (04): : 164 - 167
[30] Contrast limitations in electron-beam lithography
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[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1999, 17 (06): : 2945 - 2947