Photoinduced Ordering of Block Copolymers

被引：19

作者：

Daga, Vikram K. ^{[2
]}

Schwartz, Evan L. ^{[3
]}

Chandler, Curran M. ^{[1
]}

Lee, Jin-Kyun ^{[3
]}

Lin, Ying ^{[1
]}

Ober, Christopher K. ^{[3
]}

Watkins, James J. ^{[1
]}

机构：

[1] Univ Massachusetts, Polymer Sci & Engn Dept, Amherst, MA 01003 USA

[2] Univ Massachusetts, Dept Chem Engn, Amherst, MA 01003 USA

[3] Cornell Univ, Dept Mat Sci & Engn, Ithaca, NY 14853 USA

来源：

NANO LETTERS | 2011年 / 11卷 / 03期

关键词：

Block copolymer; photoinduced ordering; disorder-to-order transition; self-assembly; MOLECULAR GLASS RESISTS; MESOPOROUS SILICA FILMS; THIN-FILMS; INTERFERENCE LITHOGRAPHY; TRIBLOCK COPOLYMERS; DIBLOCK COPOLYMERS; PHASE-BEHAVIOR; POLYMER MELTS; BLENDS; ARRAYS;

D O I：

10.1021/nl104080v

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

Photoinduced ordering of disordered block copolymers (BCPs) would provide an on-demand, nonintrusive route for formation of well-ordered nanostructures in arbitrarily defined regions of an otherwise disordered material. Here we achieve this objective using a rapid and simple approach in which photoconversion of an additive blended with the BCP introduces strong interactions between the additive and one of the chain segments and induces strong order in the BCP blend. The strategy is generally applicable to block copolymers containing chain segments capable of hydrogen bonding with the additive.

引用

页码：1153 / 1160

页数：8

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