Study of growth kinetics of amorphous carbon nanopillars formed by PECVD

被引：0

作者：

Gromov, D. ^{[1
]}

Borgardt, N. ^{[1
]}

Grishina, Y. ^{[1
]}

Dedkova, A. ^{[2
]}

Kirilenko, E.

Dubkov, S. ^{[1
]}

机构：

[1] Natl Res Univ Elect Technol, Moscow, Russia

[2] Sci Technol Ctr Nano & Microsyst Tech, Moscow, Russia

来源：

INTERNATIONAL CONFERENCE ON MICRO- AND NANO-ELECTRONICS 2014 | 2014年 / 9440卷

关键词：

PECVD; mechanical stress; carbon nanostructure; nanopillars; nanoflakes; thin film; NANOTUBES; STRENGTH; MODULUS;

D O I：

10.1117/12.2179765

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

In this paper we study the process of plasma enhanced chemical vapor deposition (PECVD) of carbon nanostructures in the form of a film, the pillars, the flakes at a temperature of 100-350 degrees C from the vapor-gas mixture H-2+CO+Ar. Also in the paper presents the structural features of the carbon nanopillars obtained at 250 degrees C. Determined mechanical stresses occurring during the growth of carbon nanostructures. Investigated the features of the growth of carbon pillars and proposed a phenomenological description of the process of their formation during PECVD process.

引用

页数：9

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