Electrochemical deposition and microstructure of copper (I) oxide films

被引：95
|
作者：
Zhou, YC
Switzer, JA
机构：
[1] Chinese Acad Sci, Inst Met Res, Shenyang 110015, Peoples R China
[2] Univ Missouri, Dept Chem, Rolla, MO 65401 USA
[3] Univ Missouri, Grad Ctr Mat Res, Rolla, MO 65401 USA
来源：
SCRIPTA MATERIALIA | 1998年 / 38卷 / 11期
基金：
美国国家科学基金会; 中国国家自然科学基金;
关键词：
D O I：
10.1016/S1359-6462(98)00091-8
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
[No abstract available]
引用
收藏
页码：1731 / 1738
页数：8
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