Hybrid integration of carbon nanotube and amorphous IGZO thin-film transistors

被引:7
|
作者
Lee, Yongwoo [1 ]
Yoon, Jinsu [1 ]
Jang, Jun Tae [1 ]
Choi, Bongsik [1 ]
Kim, Hyo-Jin [1 ]
Park, Geon-Hwi [1 ]
Kim, Dong Myong [1 ]
Kim, Dae Hwan [1 ]
Kang, Min-Ho [2 ]
Choi, Sung-Jin [1 ]
机构
[1] Kookmin Univ, Sch Elect Engn, Seoul 02707, South Korea
[2] Natl Nanofab Ctr NNFC, Dept Nanoproc, Daejeon 34141, South Korea
基金
新加坡国家研究基金会;
关键词
HIGH-PERFORMANCE; CIRCUITS; OXIDE;
D O I
10.1063/1.5139085
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Solution-processed carbon nanotubes (CNTs) have recently attracted significant attention as p-type thin-film transistor (TFT) channels due to their high carrier mobility, high uniformity, and low process temperature. However, implementing sophisticated macroelectronics with a combination of single CNT-TFTs has been challenging because it is difficult to fabricate n-type CNT-TFTs. Therefore, in combination with indium-gallium-zinc-oxide (IGZO), which has excellent electrical performance and has been commercialized as an n-type oxide TFT, we demonstrated various hybrid complementary metal-oxide semiconductor integrated circuits, such as inverters and NOR and NAND gates. This hybrid integration approach allows us to combine the strength of p-type CNT- and n-type IGZO-TFTs, thus offering a significant improvement for macroelectronic applications. (C) 2020 Author(s). All article content, except where otherwise noted, is licensed under a Creative Commons Attribution (CC BY) license (http://creativecommons.org/licenses/by/4.0/).
引用
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页数:5
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