Distribution of the intensity absorbed by the keyhole wall in laser processing

被引：14
|
作者：
Ho, CY [1 ]
Wen, MY
机构：
[1] Hwa Hsia Coll Technol & Commerce, Dept Mech Engn, Taipei 235, Taiwan
[2] Grad Inst Mechatron Engn, Cheng Shiu Inst Technol, Kaohsiung 833, Taiwan
来源：
JOURNAL OF MATERIALS PROCESSING TECHNOLOGY | 2004年 / 145卷 / 03期
关键词：
multiple reflections; fresnel absorption; Inverse Bremsstrahlung absorption;
D O I：
10.1016/j.jmatprotec.2003.07.009
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
The distribution of the energy flux absorbed by the wall is investigated after the laser beam undergoes multiple diffuse and specular reflections in a hemispherical cavity. The laser beam is characterized by different energy distribution parameter, wavelength, and polarization. Inverse Bremsstrahlung absorption within the plasma and Fresnel absorption on the cavity wall are taken into account. Scattering within the plasma, radiation absorption due to surface temperature and alternation of polarization in the process of multiple reflections are assumed to be negligible. The analytic model is derived and compared with the Monte Carlo method. The influences of wavelength, polarization, inverse Bremsstrahlung absorption coefficient and material property on the absorbed intensity are discussed. (C) 2003 Published by Elsevier B.V.
引用
收藏
页码：303 / 310
页数：8
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