Effect of Nitrogen Pressure on the Structure of Cr-N, Ta-N, Mo-N, and W-N Nanocrystals Synthesized by Arc Discharge

被引:19
|
作者
Shen, Longhai [1 ]
Wang, Nan [1 ]
机构
[1] Shenyang Ligong Univ, Sch Sci, Shenyang 110159, Peoples R China
基金
中国国家自然科学基金;
关键词
TUNGSTEN NITRIDE; CHROMIUM NITRIDE; MOLYBDENUM NITRIDE; DEPOSITION; STRESSES; POWDERS;
D O I
10.1155/2011/781935
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The effect of nitrogen pressure on the structure of Ta-N, Cr-N, Mo-N, and W-N nanocrystals formed in arc discharge process was investigated. At the nitrogen pressure of 5 similar to 20 kPa, the pure cubic-phase TaN and CrN nanocrystals were formed, whereas pure cubic phase of Mo2N and W2N cannot be obtained. A little of metal Mo and a mass of metal W were mixed with the products of Mo2N and W2N, respectively. At the nitrogen pressure of 30 similar to 50 kPa, subnitride Ta2N and Cr2N and metal Cr were gradually formed in the product; furthermore, the proportion of metal Mo and W increased in the product of Mo2N and W2N, respectively. It indicated that the low nitrogen pressure makes cubic mononitride formation favorable. We explain this experimental observation in terms of the evaporation rate of anode metal and the ionization of nitrogen.
引用
收藏
页数:5
相关论文
共 50 条
  • [1] Point defects stabilise cubic Mo-N and Ta-N
    Koutna, Nikola
    Holec, David
    Svoboda, Ondrej
    Klimashin, Fedor F.
    Mayrhofer, Paul H.
    JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2016, 49 (37)
  • [2] Physical and electrical properties of Ta-N, Mo-N, and W-N electrodes on HfO2 high-k gate dielectric
    Lu, J
    Kuo, Y
    Chatterjee, S
    Tewg, JY
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2006, 24 (01): : 349 - 357
  • [3] A THERMODYNAMIC EVALUATION OF THE CR-N, FE-N, MO-N AND CR-MO-N SYSTEMS
    FRISK, K
    CALPHAD-COMPUTER COUPLING OF PHASE DIAGRAMS AND THERMOCHEMISTRY, 1991, 15 (01): : 79 - 106
  • [4] Magneli phase formation of PVD Mo-N and W-N coatings
    Gassner, G.
    Mayrhofer, P. H.
    Kutschej, K.
    Mitterer, C.
    Kathrein, M.
    SURFACE & COATINGS TECHNOLOGY, 2006, 201 (06): : 3335 - 3341
  • [5] PROPERTIES OF W-N AND MO-N FILMS PREPARED BY REACTIVE SPUTTERING
    SHIH, KK
    DOVE, DB
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1990, 8 (03): : 1359 - 1363
  • [6] Comparative Study of Ta-N and W-N Films Deposited by Reactive Magnetron Sputtering
    Yang, J. F.
    Yuan, Z. G.
    Wang, X. P.
    Fang, Q. F.
    NANOSCIENCE AND NANOTECHNOLOGY LETTERS, 2011, 3 (02) : 280 - 284
  • [7] Influence of Sputtering Target Power on Microstructure and Mechanical Properties of W-N and Ta-N Coatings
    Yang, J. F.
    Prakash, B.
    Yuan, Z. G.
    Jiang, Y.
    Wang, X. P.
    Fang, Q. F.
    NANOSCIENCE AND NANOTECHNOLOGY LETTERS, 2012, 4 (06) : 604 - 608
  • [8] Effects of nitrogen partial pressure in Ta-N films grown by the cathodic vacuum arc technique
    Li, Li
    Lv, GuoHua
    Yang, Si-ze
    JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2013, 46 (28)
  • [9] Effect of nitrogen pressure, bias voltage and substrate temperature on the phase structure of Mo-N coatings produced by cathodic arc PVD
    Kazmanli, MK
    Ürgen, M
    Cakir, AF
    SURFACE & COATINGS TECHNOLOGY, 2003, 167 (01): : 77 - 82