Learnings from an Open Science Effort: Virtual Project on the History of ALD

被引:2
|
作者
Puurunen, R. L. [1 ]
机构
[1] Aalto Univ, Sch Chem Engn, Dept Chem & Met Engn, Espoo, Finland
来源
基金
芬兰科学院;
关键词
ATOMIC LAYER DEPOSITION;
D O I
10.1149/08606.0003ecst
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
This work summarizes learnings from an Open Science effort "Virtual project on the History of ALD" (VPHA), started in 2013 to clarify the early history of atomic layer deposition (ALD). ALD is a multi-tool of nanotechnology and has been e.g. enabler of the continuation of Moore's law of transistor scaling. ALD has been developed historically through two independent routes: atomic layer epitaxy (ALE) and molecular layering (ML). Especially the details on ML have remained little known to a broader audience. In this contribution, learnings in VPHA are seen from the viewpoint of its voluntary coordinator (the author self) related to historical details of ALD as well as from an organizational viewpoint and some other viewpoints. Selected details related to ALD's history not fully accurately described in three earlier review articles are pointed out. The work made in VPHA has resulted in journal articles, presentations and an exhibition, and VPHA has in part provided the foundation for granting the 2018 Millennium Technology Prize to Dr. Tuomo Suntola. At the time of writing this contribution, in July 2018, VPHA is still on-going, and more volunteers are welcome to join the effort.
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页码:3 / 17
页数:15
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