Infrared reflection absorption spectroscopy of selective etching and decomposition stimulated by synchrotron radiation

被引：1
|
作者：
Urisu, T
机构：
来源：
MRS BULLETIN | 1999年 / 24卷 / 01期
关键词：
D O I：
10.1557/S0883769400051733
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
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页码：46 / 48
页数：3
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