Letter: New fragment ion production method using super cold electrons in electron cyclotron resonance plasma

被引:1
|
作者
Kidera, Masanori [1 ]
Takahashi, Kazuya [1 ]
Enomoto, Shuichi [1 ]
Goto, Akira [1 ]
Yano, Yasushige [1 ]
机构
[1] RIKEN, Nishina Ctr Accelerator Based Sci, Wako, Saitama 3510198, Japan
关键词
electron cyclotron resonance; fragment; super cold electron; metallocene; ferrocene; nickelocene; osmocene; ECRIS mass spectrometer;
D O I
10.1255/ejms.887
中图分类号
O64 [物理化学(理论化学)、化学物理学]; O56 [分子物理学、原子物理学];
学科分类号
070203 ; 070304 ; 081704 ; 1406 ;
摘要
We examined the fragmentation and ionization of molecules by low-temperature electrons generated by electron cyclotron resonance (ECR) plasma. We examined several types of metallocene compounds comprising a metal and 1,3-cyclopentadienes as ligands. We performed analyses using an ECR ion source (ECRIS) mass spectrometer. Consequently, we succeeded in ionizing fragments of an organometallic compound by adjusting the input power of the microwave introducing a super high-frequency plasma. Moreover, we succeeded in dynamically generating a significant quantity of fragment ions by continuously varying the input power. Information on the structure of a molecule may be acquired from this operation. Moreover, a molecule that could not be easily ionized thus far may now be ionizable when soft ionization is performed with this technique.
引用
收藏
页码:355 / 358
页数:4
相关论文
共 50 条
  • [31] Downstream ion drift in an electron cyclotron resonance plasma process
    Beresford, R
    JOURNAL OF APPLIED PHYSICS, 1996, 79 (03) : 1292 - 1297
  • [32] Numerical simulation of the plasma of an electron cyclotron resonance ion source
    Girard, A
    Lécot, C
    Serebrennikov, K
    JOURNAL OF COMPUTATIONAL PHYSICS, 2003, 191 (01) : 228 - 248
  • [33] MEASUREMENT OF ION TEMPERATURE IN ELECTRON-CYCLOTRON-RESONANCE PLASMA
    OKUNO, Y
    OHTSU, Y
    FUJITA, H
    CHEN, W
    MIYAKE, S
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1993, 32 (11B): : L1698 - L1700
  • [34] Glow plasma trigger for electron cyclotron resonance ion sources
    Vodopianov, A. V.
    Golubev, S. V.
    Izotov, I. V.
    Nikolaev, A. G.
    Oks, E. M.
    Savkin, K. P.
    Yushkov, G. Yu.
    REVIEW OF SCIENTIFIC INSTRUMENTS, 2010, 81 (02):
  • [35] Simulation of ion transport in an extended electron cyclotron resonance plasma
    Liu, MH
    Hu, XW
    Wu, HM
    Wu, QC
    Yu, GY
    Ren, ZX
    JOURNAL OF APPLIED PHYSICS, 2000, 87 (03) : 1070 - 1075
  • [36] ION-TRANSPORT IN AN ELECTRON-CYCLOTRON RESONANCE PLASMA
    SADEGHI, N
    NAKANO, T
    TREVOR, DJ
    GOTTSCHO, RA
    JOURNAL OF APPLIED PHYSICS, 1991, 70 (05) : 2552 - 2569
  • [37] INVESTIGATION OF HOT-ELECTRONS IN ELECTRON-CYCLOTRON-RESONANCE ION SOURCES
    BARUE, C
    LAMOUREUX, M
    BRIAND, P
    GIRARD, A
    MELIN, G
    JOURNAL OF APPLIED PHYSICS, 1994, 76 (05) : 2662 - 2670
  • [38] Influence of electron cyclotron resonance ion source parameters on high energy electrons
    Li, J. B.
    Li, L. X.
    Li, L. B.
    Guo, J. W.
    Hitz, D.
    Lu, W.
    Feng, Y. C.
    Zhang, W. H.
    Zhang, X. Z.
    Zhao, H. Y.
    Sun, L. T.
    Zhao, H. W.
    REVIEW OF SCIENTIFIC INSTRUMENTS, 2020, 91 (08):
  • [39] Electron cyclotron resonance plasma production by using pulse mode microwaves and dependences of ion beam current and plasma parameters on the pulse condition
    Kiriyama, Ryutaro
    Takenaka, Tomoya
    Kurisu, Yousuke
    Nozaki, Dai
    Sato, Fuminobu
    Kato, Yushi
    Lida, Toshiyuki
    REVIEW OF SCIENTIFIC INSTRUMENTS, 2012, 83 (02):
  • [40] A NEW ULTRAFINE GROOVE FABRICATION METHOD UTILIZING ELECTRON-CYCLOTRON RESONANCE PLASMA DEPOSITION AND REACTIVE ION ETCHING
    OHKI, S
    ODA, M
    SHIBATA, T
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1988, 6 (02): : 533 - 536