Atomic-scale optical monitoring of the initial growth of TiO2 thin films

被引：14

作者：

Niilisk, A ^{[1
]}

Rosental, A ^{[1
]}

Gerst, A ^{[1
]}

Sammelselg, V ^{[1
]}

Uustare, T ^{[1
]}

机构：

[1] Univ Tartu, Inst Phys, EE-51014 Tartu, Estonia

来源：

SMART OPTICAL INORGANIC STRUCTURES AND DEVICES | 2001年 / 4318卷

关键词：

atomic-layer chemical vapor deposition (ALCVD/ALE); TiO2; in situ optical diagnostics; ultrathin films; crystal structure; surface morphology;

D O I：

10.1117/12.417579

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

The initial atomic-layer-chemical-vapor-deposition growth of titanium dioxide from TiCl4 and water on quartz glass substrates is monitored in real time by incremental dielectric reflection. An interesting means for bringing the growth from the very beginning into a time-homogeneous mode is proposed and preliminarily studied. It consists in an in situ TiCl4-treatment procedure. The crystal structure and surface morphology of the prepared ultrathin films are characterized.

引用

页码：72 / 77

页数：6

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