Image transfer with subwavelength resolution to metal-dielectric interface

被引：7

作者：

Intaraprasonk, Varat ^{[2
]}

Yu, Zongfu ^{[1
]}

Fan, Shanhui ^{[1
]}

机构：

[1] Stanford Univ, Dept Elect Engn, Stanford, CA 94305 USA

[2] Stanford Univ, Dept Appl Phys, Stanford, CA 94305 USA

来源：

JOURNAL OF THE OPTICAL SOCIETY OF AMERICA B-OPTICAL PHYSICS | 2011年 / 28卷 / 05期

关键词：

EVANESCENT FIELDS; SURFACE-PLASMONS; NANOLITHOGRAPHY; LENS; PHOTOLITHOGRAPHY; INTERFERENCE;

D O I：

10.1364/JOSAB.28.001335

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

In image transfer, one aims to reproduce at an image plane the field distribution of the field at the source plane. We consider a near-field image transfer scheme where an image with subwavelength resolution can be transferred to a metal-dielectric interface. In this scheme, the presence of a surface plasmon polariton provides a large wave vector range where the transfer function is flat, thus enabling the image transfer with subwavelength resolution. (c) 2011 Optical Society of America

引用

页码：1335 / 1338

页数：4

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