Generation of microwave-excited atmospheric-pressure line plasma and its application

被引：3
|
作者：
Kuwahata, Hiroshi [1 ]
Miyata, Hiroshi [1 ]
Isomura, Masao [1 ]
Shindo, Haruo [2 ]
机构：
[1] Tokai Univ, Sch Engn, Dept Elect & Elect Engn, Hiratsuka, Kanagawa 2591292, Japan
[2] Plasma Res Lab Co Ltd, Atsugi, Kanagawa 2430035, Japan
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS | 2017年 / 56卷 / 12期
关键词：
DIELECTRIC BARRIER DISCHARGE; CORONA DISCHARGE; NONEQUILIBRIUM PLASMA; SURFACE-TREATMENT; THIN-FILMS; WATER; DEPOSITION; ACTIVATION; SILICON;
D O I：
10.7567/JJAP.56.126201
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
A new 2.45 GHz microwave-excited atmospheric-pressure line plasma system was developed. An atmospheric-pressure helium (He) line plasma with a length of similar to 350 mm and a width of similar to 6 mm was generated in air at a microwave power of 1100 W. The length of the He line plasma was varied in the range of similar to 120-350 mm by changing the width of the waveguide in the microwave tube and the position of the short plunger. When a Si wafer was irradiated with the He line plasma for 10 s, the surface of the Si wafer became superhydrophilic in a belt shape. On the basis of these results, the new microwave-excited atmospheric-pressure He line plasma system was found to be effective for dry cleaning large-area surfaces, such as semiconductor substrates and glass plates used in flat-panel displays. (C) 2017 The Japan Society of Applied Physics
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页数：6
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