Wetting behavior of silicon nanowires array fabricated by Metal-assisted chemical etching

被引:8
|
作者
Muduli, Rama Chandra [1 ,2 ]
Sahoo, Mihir Kumar [1 ]
Kale, Paresh [1 ,2 ]
机构
[1] NIT Rourkela, Dept Elect Engn, Rourkela 769008, Odisha, India
[2] Indian Inst Technol, DST IIT Bombay Energy Storage Platform Hydrogen, Mumbai 400076, Maharashtra, India
关键词
Porous silicon; Silicon nanowires; Superhydrophobicity; De-wetting; Contact angle measurement; Aging effect; SURFACES;
D O I
10.1016/j.matpr.2022.04.635
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
A silicon (Si) substrate exhibits a hydrophobic surface (contact angle, CA similar to 90.2 degrees), and upon anodization, the porous Si (PSi) also possesses a hydrophobic surface (CA similar to 142.4 degrees). Silicon nanowires (SiNWs) array, also known as black silicon, exhibits lotus effect, i.e., water droplet role-over the surface without penetrating inside the surface. An array of SiNWs, fabricated by metal-assisted chemical etching (MACE) of Si, act as a superhydrophobic surface (i.e., CA > 150 degrees) without using any functionalization material. The MACE fabricates etched-Si, using PSi substrate that also possesses a superhydrophobic surface. Trapped air, present among the conical tips of the densely formed SiNWs array, reduces the solid-liquid contact area and improves the de-wetting behavior. The trapped air increases on increasing the length of SiNWs, which further enhances the de-wetting behavior. The wetting behavior changes to hydrophobic/hydrophilic when kept for a longer duration due to the aging effect. Oxidation causes aging and changes the conical/dendrite structure of the SiNWs/etched-Si surface. The Fourier transform infrared spectroscopy confirms the hydrogen passivation on the surfaces of SiNWs because of HF etching and highly oxidized surfaces due to the effect of aging. Copyright (C) 2022 Elsevier Ltd. All rights reserved.
引用
收藏
页码:5917 / 5922
页数:6
相关论文
共 50 条
  • [31] Effect of Temperature to The Structure of Silicon Nanowires Growth by Metal-Assisted Chemical Etching
    Omar, H.
    Salifairus, M. J.
    Alrokayan, Salman A. H.
    Khan, Haseeb A.
    Jani, A. M. M.
    Rusop, M.
    Abdullah, S.
    2015 IEEE STUDENT CONFERENCE ON RESEARCH AND DEVELOPMENT (SCORED), 2015, : 649 - 652
  • [32] Metal-Assisted Chemical Etching of Silicon: A Review
    Huang, Zhipeng
    Geyer, Nadine
    Werner, Peter
    de Boor, Johannes
    Goesele, Ulrich
    ADVANCED MATERIALS, 2011, 23 (02) : 285 - 308
  • [33] Deep Etching of Silicon Based on Metal-Assisted Chemical Etching
    Nur'aini, Anafi
    Oh, Ilwhan
    ACS OMEGA, 2022, 7 (19): : 16665 - 16669
  • [34] Influence of pre-surface treatment on the morphology of silicon nanowires fabricated by metal-assisted etching
    Shiu, Shu-Chia
    Lin, Shin-Bo
    Hung, Shih-Che
    Lin, Ching-Fuh
    APPLIED SURFACE SCIENCE, 2011, 257 (06) : 1829 - 1834
  • [35] Influence of Experimental Conditions on the Antireflection Properties of Silicon Nanowires Fabricated by Metal-Assisted Etching Method
    Ding, Jianning
    Zhang, Fuqing
    Yuan, Ningyi
    Cheng, Guanggui
    Wang, Xiuqin
    Ling, Zhiyong
    Zhang, Zhongqiang
    CURRENT NANOSCIENCE, 2014, 10 (03) : 402 - 408
  • [36] Silicon nanowires with controlled sidewall profile and roughness fabricated by thin-film dewetting and metal-assisted chemical etching
    Azeredo, B. P.
    Sadhu, J.
    Ma, J.
    Jacobs, K.
    Kim, J.
    Lee, K.
    Eraker, J. H.
    Li, X.
    Sinha, S.
    Fang, N.
    Ferreira, P.
    Hsu, K.
    NANOTECHNOLOGY, 2013, 24 (22)
  • [37] Fabrication of Silicon Nanowires by Metal-Assisted Chemical Etching Combined with Micro-Vibration
    Huang, Weiye
    Wu, Junyi
    Li, Wenxin
    Chen, Guojin
    Chu, Changyong
    Li, Chao
    Zhu, Yucheng
    Yang, Hui
    Chao, Yan
    MATERIALS, 2023, 16 (15)
  • [38] Raman diagnostics of photoinduced heating of silicon nanowires prepared by metal-assisted chemical etching
    S. P. Rodichkina
    L. A. Osminkina
    M. Isaiev
    A. V. Pavlikov
    A. V. Zoteev
    V. A. Georgobiani
    K. A. Gonchar
    A. N. Vasiliev
    V. Yu. Timoshenko
    Applied Physics B, 2015, 121 : 337 - 344
  • [39] Growth, Structure and Optical Properties of Silicon Nanowires Formed by Metal-Assisted Chemical Etching
    Gonchar, K. A.
    Osminkina, L. A.
    Galkin, R. A.
    Gongalsky, M. B.
    Marshov, V. S.
    Timoshenko, V. Yu
    Kulmas, M. N.
    Solovyev, V. V.
    Kudryavtsev, A. A.
    Sivakov, V. A.
    JOURNAL OF NANOELECTRONICS AND OPTOELECTRONICS, 2012, 7 (06) : 602 - 606
  • [40] A Processing Window for Fabricating Heavily Doped Silicon Nanowires by Metal-Assisted Chemical Etching
    Qi, Yangyang
    Wang, Zhen
    Zhang, Mingliang
    Yang, Fuhua
    Wang, Xiaodong
    JOURNAL OF PHYSICAL CHEMISTRY C, 2013, 117 (47): : 25090 - 25096