Deposition of M-C (M = Cr, Mn, Fe) films by magnetron sputtering

被引:1
|
作者
Hou, QR [1 ]
Zhang, HY [1 ]
机构
[1] Tsing Hua Univ, Dept Phys, Beijing 100084, Peoples R China
来源
MODERN PHYSICS LETTERS B | 2005年 / 19卷 / 11期
关键词
transition metal carbide; mechanical properties; electrical resistivity;
D O I
10.1142/S0217984905008505
中图分类号
O59 [应用物理学];
学科分类号
摘要
Thin films of M-C (M = Cr, Mn, Fe) have been deposited on silicon substrates by magnetron sputtering. It was found that interdiffusion between carbide films and silicon substrates occurred for Mn-C/Si and Fe-C/Si samples. The hardness and elastic modulus of the Cr-C films were around 16 +/- 1 GPa and 210 +/- 21 GPa, respectively. Mn-C and Fe-C films were not so hard as Cr-C films. The resistivity of these films at room temperature was between 0.267 and 3.40 m Omega cm. The resistivity of Cr-C and Mn-C films changed a little with time at 673 K in air.
引用
收藏
页码:529 / 537
页数:9
相关论文
共 50 条
  • [41] The Properties of Cr-Co-Cu-Fe-Ni Alloy Films Deposited by Magnetron Sputtering
    Shaginyan, L. R.
    Britun, V. F.
    Krapivka, N. A.
    Firstov, S. A.
    Kotko, A. V.
    Gorban, V. F.
    POWDER METALLURGY AND METAL CERAMICS, 2018, 57 (5-6) : 293 - 300
  • [42] ELECTRONIC-STRUCTURE OF MH2-(M=CR, M=MN, M=FE, M=CO, M=NI) ANIONS
    GUTSEV, GL
    ZHURNAL FIZICHESKOI KHIMII, 1988, 62 (08): : 2096 - 2102
  • [43] Magnetic properties of Fe films epitaxially grown on Cr/GaAs(100) by dc magnetron sputtering
    Li, B
    Fermin, JR
    Azevedo, A
    de Aguiar, FM
    Rezende, SM
    APPLIED PHYSICS LETTERS, 1998, 72 (21) : 2760 - 2762
  • [44] Preparation and characterization of lanthanum-based perovskite oxides LaMO3 (M=Fe, Cr, Mn) thin films by electrophoretic deposition
    Aljurays, Raghad K.
    Loucif, Aicha
    Amer, Mabrook S.
    AlMayouf, Abdullah M.
    MATERIALS RESEARCH EXPRESS, 2023, 10 (06)
  • [45] A RECIPROCAL MODEL FOR LIQUID M-C SOLUTIONS
    ANDERSSON, JO
    CALPHAD-COMPUTER COUPLING OF PHASE DIAGRAMS AND THERMOCHEMISTRY, 1987, 11 (04): : 365 - 367
  • [46] Deposition of hard magnetic rare-earth-Fe-B thin films by magnetron sputtering
    Castaldi, L. (m.r.gibbs@sheffield.ac.uk), 1600, American Institute of Physics Inc. (93):
  • [47] Deposition of hard magnetic rare-earth-Fe-B thin films by magnetron sputtering
    Castaldi, L
    Gibbs, MRJ
    Davies, HA
    JOURNAL OF APPLIED PHYSICS, 2003, 93 (11) : 9165 - 9169
  • [48] IMPROVING ON BASIC EGG - M-C CLOZE
    JONZ, J
    LANGUAGE LEARNING, 1976, 26 (02) : 255 - 265
  • [49] Ion-assisted pulsed magnetron sputtering deposition of ta-C films
    Bugaev, SP
    Podkovyrov, VG
    Oskomov, KV
    Smaykina, SV
    Sochugov, NS
    THIN SOLID FILMS, 2001, 389 (1-2) : 16 - 26
  • [50] Mechanical properties and electronic structures of M23C6 (M = Fe, Cr, Mn)-type multicomponent carbides
    Liu, Yangzhen
    Jiang, Yehua
    Xing, Jiandong
    Zhou, Rong
    Feng, Jing
    JOURNAL OF ALLOYS AND COMPOUNDS, 2015, 648 : 874 - 880