Observation of phonon sideband emission in intrinsic InN nanowires: a photoluminescence and micro-Raman scattering study

被引:20
|
作者
Zhao, S. [1 ]
Wang, Q. [1 ]
Mi, Z. [1 ]
Fathololoumi, S. [1 ]
Gonzalez, T. [2 ]
Andrews, M. P. [2 ]
机构
[1] McGill Univ, Dept Elect & Comp Engn, Montreal, PQ H3A 2A7, Canada
[2] McGill Univ, Dept Chem, Montreal, PQ H3A 2A7, Canada
基金
加拿大自然科学与工程研究理事会; 加拿大创新基金会;
关键词
INDIUM NITRIDE NANOWIRES; EPITAXIAL-GROWTH; MORPHOLOGY; SILICON; LAYER; GAP;
D O I
10.1088/0957-4484/23/41/415706
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
In this work, photoluminescence and micro-Raman scattering experiments were performed on undoped InN nanowires. It was found that, besides the main photoluminescence peak, a clear phonon sideband emission peak, with an extremely narrow linewidth similar to 9 meV, was measured. The phonon spectrum revealed by micro-Raman scattering indicates only uncoupled LO phonons are involved in such phonon sideband emission. The clearly resolved phonon sideband emission peak with a narrow linewidth, together with the uncoupled LO phonon modes, suggests the superior quality of the presented InN nanowires, i.e., extremely low residual electron density and the absence of surface electron accumulation, which is consistent with the physical properties of intrinsic InN nanowires as in the previous studies. The detailed phonon sideband properties are also discussed in the text.
引用
收藏
页数:5
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