Effect of the starting surfaces of GaN on defect formation in epitaxial Co thin films

被引:3
|
作者
Li, H. D. [1 ,2 ]
Wong, T. L. [3 ]
Wang, N. [3 ]
Wang, J. [4 ]
Li, Q. [4 ]
Xie, M. H. [1 ]
机构
[1] Univ Hong Kong, Dept Phys, Hong Kong, Hong Kong, Peoples R China
[2] Beijing Jiaotong Univ, Dept Phys, Beijing 100044, Peoples R China
[3] Hong Kong Univ Sci & Technol, Dept Phys, Kowloon, Hong Kong, Peoples R China
[4] Chinese Univ Hong Kong, Dept Phys, Shatin, Hong Kong, Peoples R China
关键词
GAN(0001) SURFACE; GROWTH;
D O I
10.1063/1.3652761
中图分类号
O59 [应用物理学];
学科分类号
摘要
Growths of Co epifilms on GaN(0001)-"1 x 1" and (1 x 1) surfaces were studied, where the structural properties of the crystals and the interfaces are compared. Stacking faults are seen to be abundant in epitaxial Co films grown on excess Ga covered GaN(0001)-"1 x 1" surface. Such stacking defects are effectively suppressed in Co films grown on less excess Ga covered GaN(0001)-(1 x 1) surfaces. The hetero-interface between Co and GaN(0001) is characterized by a disordered or amorphous region, and diffusion of Ga and N from the substrate into Co is suggested. (C) 2011 American Institute of Physics. [doi:10.1063/1.3652761]
引用
收藏
页数:4
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