Low-Macroscopic-Field Electron Emission from Metal Thin Films

被引：0
|
作者：
Bizyaev, I. S. [1 ]
Gabdullin, P. G. [1 ]
Chumak, M. A. [1 ]
Babyuk, V. Ye [1 ]
Davydov, S. N. [1 ]
Arkhipov, A., V [1 ]
Kvashenkina, O. E. [1 ]
机构：
[1] Peter Great St Petersburg Polytech Univ, St Petersburg, Russia
来源：
2021 34TH INTERNATIONAL VACUUM NANOELECTRONICS CONFERENCE (IVNC) | 2021年
关键词：
NANOPARTICLES;
D O I：
暂无
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
Films of Mo, Zr, W, Ni and Ti with thickness 2-20 nm were deposited by magnetron sputtering on Si substrates. After conditioning by the combined action of temperature (300-600 degrees C) and electric field, films of Mo and Zr showed the capability of cold electron emission in an electric field 1.5-5 V/mu m. Microscopic studies of the emissive samples revealed a partial reconstruction of the initially continuous films to the island form.
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页码：227 / 228
页数：2
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