GROWTH AND CHARACTERIZATION OF INGAN FOR PHOTOVOLTAIC DEVICES

被引:0
|
作者
Boney, C. [1 ,2 ]
Hernandez, I. [1 ]
Pillai, R. [2 ]
Starikov, D. [1 ,2 ]
Bensaoula, A. [2 ,3 ]
Henini, M. [4 ]
Syperek, M. [5 ]
Misiewicz, Jan [5 ]
Kudrawiec, R. [5 ]
机构
[1] Integrated Micro Sensors Inc, Houston, TX 77096 USA
[2] Univ Houston, Dept Phys, Nitride Mat & Devices Lab, Houston, TX 77004 USA
[3] Univ Houston, Dept Elect & Comp Engn, Nitride Mat & Devices Lab, Houston, TX 77004 USA
[4] Univ Nottingham, Sch Phys & Astron, Nottingham Nanotechnol & Nanosci Ctr, Nottingham NG7 2RD, England
[5] Wroclaw Univ Technol, Inst Phys, PL-50370 Wroclaw, Poland
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中图分类号
TE [石油、天然气工业]; TK [能源与动力工程];
学科分类号
0807 ; 0820 ;
摘要
In this work we present the growth and characterization of InxGa1-xN-based materials and solar cells with x up to 0.54. Growth of single phase InxGa1-xN is achieved using Plasma Assisted Molecular Beam Epitaxy (PAMBE) with flux modulation for active species. The material is characterized by x-ray diffraction, electrochemical capacitance-voltage, time-resolved photo-luminescence, and contactless electroreflectance. Fabricated devices are then studied for photo-response under simulated AM0 spectral conditions to evaluate solar cell characteristics. The dark and illuminated J-V results indicate the existence of significant shunt and series resistances arising from material defects and non-optimized device design.
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