Self-consistent simulation of radio-frequency discharge in Ar-SiH4 with strong dust contamination

被引:0
|
作者
Schweigert, V [1 ]
Alexandrov, A [1 ]
机构
[1] RAS, Inst Theoret & Appl Mech, Novosibirsk, Russia
关键词
D O I
暂无
中图分类号
O35 [流体力学]; O53 [等离子体物理学];
学科分类号
070204 ; 080103 ; 080704 ;
摘要
引用
收藏
页码:195 / 196
页数:2
相关论文
共 39 条
  • [31] Hybrid model of radio-frequency low-pressure inductively coupled plasma discharge with self-consistent electron energy distribution and 2D electric field distribution
    Yang, Wei
    Wang, You-Nian
    PLASMA PHYSICS AND CONTROLLED FUSION, 2021, 63 (03)
  • [32] A self-consistent global model of solenoidal-type inductively coupled plasma discharges including the effects of radio-frequency bias power
    Kwon, D. C.
    Chang, W. S.
    Park, M.
    You, D. H.
    Song, M. Y.
    You, S. J.
    Im, Y. H.
    Yoon, J. -S.
    JOURNAL OF APPLIED PHYSICS, 2011, 109 (07)
  • [33] Self-consistent modeling of the effect of wall-neutral reactions on parallel plate radio frequency discharge plasma in pure hydrogen
    Diomede, Paola
    Hassouni, Khaled
    Longo, Savino
    Capitelli, Mario
    IEEE TRANSACTIONS ON PLASMA SCIENCE, 2007, 35 (05) : 1241 - 1246
  • [34] One-Dimensional Fluid Model of Pulse Modulated Radio-Frequency SiH4/N2/O2 Discharge
    Wang Yan
    Liu Xiangmei
    Song Yuanhong
    Wang Younian
    PLASMA SCIENCE & TECHNOLOGY, 2012, 14 (02) : 107 - 110
  • [35] One-Dimensional Fluid Model of Pulse Modulated Radio-Frequency SiH4 /N2 /O2 Discharge
    王燕
    刘相梅
    宋远红
    王友年
    Plasma Science and Technology, 2012, 14 (02) : 107 - 110
  • [36] Ion molecule and dust particle formation in Ar/CH4, Ar/C2H2 and Ar/C3H6 radio-frequency plasmas
    Do, HT
    Thieme, G
    Fröhlich, M
    Kersten, H
    Hippler, R
    CONTRIBUTIONS TO PLASMA PHYSICS, 2005, 45 (5-6) : 378 - 384
  • [37] Hybrid model of atmospheric pressure Ar/O2/TiCl4 radio-frequency capacitive discharge for TiO2 deposition
    Leblanc, A.
    Ding, Ke
    Lieberman, M. A.
    Wang, De Xin
    Zhang, Jing
    Shi, Jian Jun
    JOURNAL OF APPLIED PHYSICS, 2014, 115 (18)
  • [38] Particle-in-cell/Monte Carlo simulation of a capacitively coupled radio frequency Ar/CF4 discharge:: Effect of gas composition
    Georgieva, V
    Bogaerts, A
    Gijbels, R
    JOURNAL OF APPLIED PHYSICS, 2003, 93 (05) : 2369 - 2379
  • [39] Micro-Raman and ultraviolet ellipsometry studies on μc-Si:H films prepared by H2 dilution to the Ar-assisted SiH4 plasma in radio frequency glow discharge
    Das, D
    JOURNAL OF APPLIED PHYSICS, 2003, 93 (05) : 2528 - 2535