Narrowband ultraviolet light emission from AlGdN polycrystalline thin films

被引:0
|
作者
Kita, Takashi [1 ]
Kitayama, Shinya [1 ]
Yoshitomi, Hiroaki [1 ]
Ishihara, Tsuguo [2 ]
Izumi, Hirokazu [2 ]
Chigi, Yoshitaka [3 ]
Kasai, Yoshihiro [3 ]
Nishimoto, Tetsuro [3 ]
Tanaka, Hiroyuki [3 ]
Kobayashi, Mikihiro [3 ]
机构
[1] Kobe Univ, Grad Sch Engn, Dept Elect & Elect Engn, Nada Ku, Kobe, Hyogo 6578501, Japan
[2] Hyogo Prefectural Inst Technol, Suma Ku, Kobe, Hyogo 6540037, Japan
[3] YUMEX INC, Himeji, Hyogo 6712114, Japan
来源
关键词
Phosphor; Ultraviolet emission; Rare-earth nitrides; ALN; NM;
D O I
暂无
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
We have investigated the narrowband ultraviolet (UV) emission characteristics of rare-earth nitrides A(1-x)Gd(x)N grown by reactive magnetron sputtering in an ultra-pure process. Gd3+ ions in the alloy films efficiently emit UV luminescence at 317 nm. The transition occurs from the P-6(7/2) excited state to the S-6(7/2) ground state in the 4f orbital. The crystallographic properties of the alloy phosphor thin film are sensitive to the growth temperature. With a decrease in the growth temperature, the emission efficiency increases. Furthermore, introducing a buffer layer before growing the phosphor layer has been found to enhance the emission intensity considerably.
引用
收藏
页码:S73 / S77
页数:5
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