Room temperature ultraviolet emission from microcrystallite ZnO thin films

被引:0
|
作者
Dong, WW [1 ]
Tao, RH [1 ]
Su, QL [1 ]
Deng, ZH [1 ]
Fang, XD [1 ]
机构
[1] Acad Sinica, Anhui Inst Opt & Fine Mech, POB 1125, Hefei 230031, Anhui, Peoples R China
来源
关键词
pulsed laser deposition; ZnO; ultraviolet emission;
D O I
10.1117/12.667713
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Strong room temperature ultraviolet emission is observed in highly oriented ZnO microcrystallite films prepared on (001) sapphire substrates by pulsed laser deposition method (PLD). The influences of substrate temperature, distance between the target and the substrate, oxygen pressure, and laser energy density on structural and optical properties were systemically studied by x-ray diffraction (XRD), scanning electron microscopy (SEM) and room temperature photoluminescence (PL) measurements. The XRD as well as the SEM results showed that all the four experiment parameters had obvious effects on the structure and micrograph of the derived ZnO films. From the room temperature photoluminescence spectra, all the derived samples have a strong ultraviolet (UV) emission about 376nm, and the visible emission is depressed greatly. Additionally, the results showed that the processing parameters could obviously affect the PL properties and the reasons were also discussed. From our results, the UV PL intensity is strongly depending both on the crystallinity and the stoichiometry of the ZnO films.
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页数:7
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