Electrodeposition of Pd-Ni-P Metallic Glass Films

被引：4
|
作者：
Mochizuki, Chihiro [1 ]
Senga, Takashi [1 ]
Shibata, Masami [1 ]
机构：
[1] Univ Yamanashi, Interdisciplinary Grad Sch Med & Engn, Kofu, Yamanashi 4008511, Japan
来源：
ELECTROCHEMISTRY | 2011年 / 79卷 / 04期
关键词：
Electrodeposition; Pd-Ni-P Alloy; Metallic Glass; Current Density;
D O I：
10.5796/electrochemistry.79.249
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
In the present study, the electrodeposition of Pd-Ni-P metallic glass films has been investigated. The composition of the electrodeposited Pd-Ni-P films were controlled by adjusting the current density from 0.2 A dm(-2) to 2.5 A dm(-2). The results of DSC analysis demonstrated that the electrodeposited Pd-Ni-P films were metallic glass. The composition of the electrodeposited Pd-Ni-P films at 2.5 A dm(-2) was close to bulk metallic glass. The T-g and T-x of electrodeposited films were in good agreement with bulk metallic glass. The electrodeposition is able to fabricate the Pd-Ni-P metallic glass, which is close to bulk metallic glass.
引用
收藏
页码：249 / 251
页数：3
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