Application of breakthrough failure analysis techniques on 90nm devices with an EOS fail

被引：0
|
作者：
Bailon, MF [1 ]
Salinas, PF [1 ]
Arboleda, JS [1 ]
Miranda, JC [1 ]
机构：
[1] Intel Technol Philippines Inc, Javalera 4107, Philippines
来源：
IPFA 2005: Proceedings of the 12th International Symposium on the Physical & Failure Analysis of Integrated Circuits | 2005年
关键词：
D O I：
10.1109/IPFA.2005.1469131
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
收藏
页码：56 / 58
页数：3
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