Preparation of CeO2\SrTiO3 bilayers as a barrier material for SIS Josephson junctions

被引:3
|
作者
Wakana, H [1 ]
Michikami, O [1 ]
机构
[1] Iwate Univ, Fac Engn, Morioka, Iwate 0208551, Japan
来源
PHYSICA C | 2001年 / 357卷 / 357-360期
关键词
EBCO film; magnetron sputtering; activated oxygen plasma; CeO2 backslash SrTiO3 multi-barrier;
D O I
10.1016/S0921-4534(01)00574-3
中图分类号
O59 [应用物理学];
学科分类号
摘要
CeO2, SrTiO3 (STO) and CeO20\STO as barrier materials were deposited on c-axis-oriented EuBa2Cu3O7-delta (EBCO) films with T-c endpoints (T-ce) above 90 K, and the effects on the superconducting properties of the lower-layer EBCO were examined. For several 100-Angstrom -thick CeO2 Sputter depositions, the EBCO did not deteriorate, but the CeO2 film contained many pinholes. On the other hand, a 50-Angstrom -thick STO deteriorated an EBCO film to T-ce = 52 K. When a CeO2\STO multi-barrier was deposited, the deterioration of EBCO was reduced, and the generation of pinholes was suppressed. Activated oxygen plasma treatment was effective for the recovery of EBCO covered by a CeO2\STO multibarrier. In the differential characteristics of an I-V curve from a junction with a CeO2 (50 Angstrom)\STO (200 Angstrom) multibarrier, a gap structure was observed. (C) 2001 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:1440 / 1443
页数:4
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