Mechanism of AlGaN/GaN heterostructure field-effect transistor threshold voltage shift by illumination

被引:4
|
作者
Okada, Masaya [1 ]
Ito, Hideki [1 ]
Ao, Jin-Ping [1 ]
Ohno, Yasuo [1 ]
机构
[1] Univ Tokushima, Grad Sch Adv Technol & Sci, Tokushima 7708506, Japan
关键词
AlGaN/GaN HFET; threshold voltage; illumination; SRH statistics; deep trap; spectrum dependency;
D O I
10.1143/JJAP.47.2103
中图分类号
O59 [应用物理学];
学科分类号
摘要
It is found that AlGaN/GaN heterostructure field-effect transistor (HFET) drain current increases under illumination at a photon energy of 2.92 eV, lower than the bandgap energy. Analysis with Shockley-Read-Hall (SRH) statistics for deep traps indicates that the electron generation from deep traps in the buffer layer is responsible for the shift. The trap energy is identified that from the conduction band. High resistivity buffer layers compensated by deep traps, which are often required for high frequency applications, give larger threshold voltage variation.
引用
收藏
页码:2103 / 2107
页数:5
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