Molecular dissociation in N2-H2 microwave discharges

被引:52
|
作者
Tatarova, E [1 ]
Dias, FM
Gordiets, B
Ferreira, CM
机构
[1] Univ Tecn Lisboa, Ctr Fis Plasmas, Inst Super Tecn, P-1049001 Lisbon, Portugal
[2] Russian Acad Sci, PN Lebedev Phys Inst, Moscow 117901, Russia
来源
PLASMA SOURCES SCIENCE & TECHNOLOGY | 2005年 / 14卷 / 01期
关键词
D O I
10.1088/0963-0252/14/1/003
中图分类号
O35 [流体力学]; O53 [等离子体物理学];
学科分类号
070204 ; 080103 ; 080704 ;
摘要
A microwave N-2-H-2 discharge driven by a travelling surface wave is investigated as a source of ground state N(S-4) and H(1s) atoms. Experimental investigations have been carried out in a plasma source operating at 2.45 GHz at low-pressure conditions (p = 0.5-2 Torr). By means of optical emission spectroscopy and probe diagnostic techniques, the population densities of ground state atoms have been detected. The dissociation kinetics is discussed in the framework of a theoretical model based on a self-consistent treatment of the main discharge balances, wave electrodynamics and plasma-wall interactions. Electron-ion surface recombination processes involving HN2+ and N-2(+) ions are the most important sources of N(S-4) gas phase atoms for the conditions considered. The relative number of N(S-4) atoms in respect to the total neutral density remains approximately constant for percentages of H-2 between 10% and 50% at nearly constant electron density. The competitive interplay of two important source channels of H(1s) atoms, namely electron dissociation of H-2 and H-2 dissociation via the quenching of nitrogen N-2(a ('1) Sigma(-)(u)) and N-2 (A (3) Sigma(+)(u)) metastables, determines a smooth decrease of hydrogen dissociation when the amount of hydrogen increases up to 50% in the mixture.
引用
收藏
页码:19 / 31
页数:13
相关论文
共 50 条
  • [21] PREPARATION OF CEN BY REACTION OF CE WITH A N2-H2 MIXTURE
    HIROTA, M
    KATSURA, M
    MIYAKE, M
    JOURNAL OF ALLOYS AND COMPOUNDS, 1994, 207 : 409 - 412
  • [22] Preparation of CeN by reaction of Ce with a N2-H2 mixture
    Hirota, Masayuki, 1600, Publ by Elsevier Sequoia SA, Lausanne, Switzerland (207-8):
  • [23] Electrical and optical characterization of pulsed plasma of N2-H2
    Martinez, H.
    Yousif, F. B.
    EUROPEAN PHYSICAL JOURNAL D, 2008, 46 (03): : 493 - 498
  • [24] PHYSICAL AND CHEMICAL PROCESSES DURING THE DISSOCIATION OF H2S-CO2 MIXTURES IN MICROWAVE DISCHARGES
    BAGAUTDINOV, AZ
    ZHIVOTOV, VK
    MUSINOV, SV
    PAMPUSHKA, AM
    RUSANOV, VD
    TSOLLER, VA
    EPP, PY
    HIGH ENERGY CHEMISTRY, 1992, 26 (01) : 55 - 61
  • [25] The mechanisms of formation and decay of atoms in N2-H2 plasmas
    Brovikova, IN
    Galiaskarov, EG
    HIGH ENERGY CHEMISTRY, 2003, 37 (05) : 341 - 344
  • [26] The Mechanisms of Formation and Decay of Atoms in N2-H2 Plasmas
    I. N. Brovikova
    E. G. Galiaskarov
    High Energy Chemistry, 2003, 37 : 341 - 345
  • [27] PLASMA ANODIC NITRIDATION OF SILICON IN N2-H2 SYSTEM
    HIRAYAMA, M
    MATSUKAWA, T
    ARIMA, H
    OHNO, Y
    TSUBOUCHI, N
    NAKATA, H
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1984, 131 (03) : 663 - 666
  • [28] MEASUREMENT OF SHOCK STRUCTURE IN N2-H2 GAS MIXTURES
    BEYLICH, AE
    PHYSICS OF FLUIDS, 1969, 12 (5P2S) : I82 - &
  • [29] Temerature measurement of N2-H2 plasma by emission spectroscopy
    Dong, S.P.
    Zhuang, W.H.
    Etemadi, K.
    Benenson, D.M.
    IEEE International Conference on Plasma Science, 1995,
  • [30] Excited species in H2, N2, O2 microwave flowing discharges and post-discharges
    Ricard, A
    Gaillard, M
    Monna, V
    Vesel, A
    Mozetic, M
    SURFACE & COATINGS TECHNOLOGY, 2001, 142 : 333 - 336