Spectroscopic ellipsometry of strained Si/Ge superlattices grown by magnetron sputter epitaxy

被引：0
|
作者：
Guizzetti, G [1 ]
Patrini, M [1 ]
Sutter, P [1 ]
vonKanel, H [1 ]
机构：
[1] UNIV PAVIA,DIPARTIMENTO FIS A VOLTA,INFM,I-27100 PAVIA,ITALY
来源：
DIAGNOSTIC TECHNIQUES FOR SEMICONDUCTOR MATERIALS PROCESSING II | 1996年 / 406卷
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D O I：
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中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
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页码：383 / 387
页数：5
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