Gas discharge in thin gaps filled with argon and nitrogen at cryogenic temperatures

被引：9
|
作者：
Lodygin, A. N. [1 ]
Portsel, L. M. [1 ]
Astrov, Yu. A. [1 ]
机构：
[1] Russian Acad Sci, AF Ioffe Physicotech Inst, St Petersburg 194021, Russia
来源：
TECHNICAL PHYSICS LETTERS | 2008年 / 34卷 / 07期
基金：
俄罗斯基础研究基金会;
关键词：
51.50.+v; 52.80.Dy;
D O I：
10.1134/S1063785008070249
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
It is established that the cooling of argon-or nitrogen-filled microdischarge devices to cryogenic temperatures significantly affects the threshold potential of discharge initiation. For a discharge in the nitrogenfilled gap with a brass cathode, this effect can be explained by a decrease in the secondary electron emission coefficient, while the influence of cooling on the argon-filled gap has a more complicated nature. The results are of importance for the development of cryogenic microdischarge devices.
引用
收藏
页码：615 / 617
页数：3
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