Thermodynamic study on the carbothermal nitridation synthesis of silicon nitride using silicon kerf loss

被引:7
|
作者
Jin, Xing [1 ,2 ]
Kong, Jian [3 ]
Jiang, Shengnan [3 ]
Wei, Donghui [3 ]
Xing, Pengfei [3 ]
Zhuang, Yanxin [1 ,2 ]
机构
[1] Northeastern Univ, Minist Educ, Key Lab Electromagnet Proc Mat, Shenyang 110819, Peoples R China
[2] Northeastern Univ, Sch Mat Sci & Engn, Shenyang 110819, Peoples R China
[3] Northeastern Univ, Sch Met, Shenyang 110819, Peoples R China
关键词
Silicon kerf loss; Thermodynamic analysis; Carbothermal nitridation; Silicon nitride; LE-CHATELIERS PRINCIPLE; POLYCRYSTALLINE SILICON; STORAGE; SLURRY; PHASE; SI3N4;
D O I
10.1007/s10973-019-08543-8
中图分类号
O414.1 [热力学];
学科分类号
摘要
A novel way to produce the silicon nitride using cheaper silicon kerf loss instead of expensive pure silicon as a raw material has been studied through thermodynamic analysis and Gibbs free energy minimization method. The mass fraction of Si3N4 in products increases with increasing the temperature at atmospheric pressure with mole ratio of carbon to oxygen of 1:1. More content of carbon added in silicon kerf loss, the less content of Si2N2O and the more content of SiC formed in the product. In addition, the pressure parameter obviously influences the composition of nitridation products, which can be attributed to lots of gas-phase reactions existing in the nitridation process. With the pressure increased, the mass fraction of Si3N4 decreases below 1500 degrees C, while it increases above 1500 degrees C. In conclusion, the optimal products contain Si3N4 of 95.6 mass%, Si2N2O of 1.7 mass% and SiC of 2.7 mass%, which formed at 1032 degrees C and 1x10(-5) bar with mole ratio of carbon to oxygen of 1:3.
引用
收藏
页码:1883 / 1893
页数:11
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