Multi-patterning overlay control

被引：1
|
作者：
Ausschnitt, C. P.
Dasari, P.
机构：
来源：
OPTICAL MICROLITHOGRAPHY XXI, PTS 1-3 | 2008年 / 6924卷
关键词：
overlay control; lithography; blossom metrology;
D O I：
10.1117/12.772865
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
The extension of optical lithography to 32nm and beyond is dependent on double-patterning (DP) at critical levels. DP integration strategies result in added degrees of freedom for overlay variation. In particular, overlay control requires assessment of error among various mask/level combinations. The Blossom overlay metrology approach minimizes the size of the overlay marks associated with each mask/level while maximizing the density of marks within the overlay metrology tool's field of view (FOV). We examine Blossom enabled use cases in DP lithography control; specifically, within-field and multiple mask/level sampling.
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页数：5
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