Surface passivation of (100) InP by organic thiols and polyimide as characterized by steady-state photoluminescence

被引:40
|
作者
Schvartzman, M
Sidorov, V
Ritter, D
Paz, Y [1 ]
机构
[1] Technion Israel Inst Technol, Dept Chem Engn, IL-32000 Haifa, Israel
[2] Technion Israel Inst Technol, Dept Elect Engn, IL-32000 Haifa, Israel
关键词
D O I
10.1088/0268-1242/16/10/103
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A method for the passivation of indium phosphide, based on thiolated organic self-assembled monolayers (SAMs) that form highly ordered, close-packed structures on the semiconductor surface, is presented. It is shown that the intensity of steady-state photoluminescence (PL) of n-type InP wafers covered with the thiolated SAMS increases significantly (as much as 14-fold) upon their covering with the monolayers. The ease with which one can tailor the outer functional groups of the SAMS provides a way to connect this new class of passivators with standard encapsulators, such as polyimide. Indeed, the PL intensity of SAM-coated InP wafers was not altered upon their overcoating with polyimide, despite the high curing temperature of the polymer (200 degreesC).
引用
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页码:L68 / L71
页数:4
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