Fabrication of Three-Dimensional Si-Au Hierarchical Nanostructures by Laser Interference Lithography

被引：0
|
作者：
Dong, Litong [1 ]
Wang, Lu [1 ]
Liu, Mengnan [1 ]
Yu, Miao [1 ]
Wang, Zuobin [1 ,2 ]
Wang, Zuobin [1 ,2 ]
Zhang, Ziang [2 ,3 ]
Li, Dayou [2 ]
Zhang, Ziang [2 ,3 ]
机构：
[1] Changchun Univ Sci & Technol, JR3CN&CNM, Changchun, Jilin, Peoples R China
[2] Univ Bedfordshire, JR3CN&IRAC, Luton, Beds, England
[3] Chinese Acad Sci, Natl Astron Observ, Changchun Observ, Changchun, Jilin, Peoples R China
来源：
2018 IEEE INTERNATIONAL CONFERENCE ON MANIPULATION, MANUFACTURING AND MEASUREMENT ON THE NANOSCALE (3M-NANO) - CONFERENCE PROCEEDINGS | 2018年
基金：
国家重点研发计划;
关键词：
laser interference lithography; ICP etching; hierarchical nanostructure; antireflection; GOLD; ARRAYS; FOAM;
D O I：
暂无
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
This paper reports a method for the fabrication of 3D Si-Au hierarchical nanostructures to improve the optical performances through four-beam laser interference lithography (LIL) and inductively coupled plasma (ICP) etching. The 3D Si-Au hierarchical nanostructures were composed of silicon tapered pillar arrays, Au grids, and Au islands, and they demonstrated wide-angle antireflective properties less than 25% reflection in the entire visible wavelengths. In addition, many special properties could be obtained by displacing the islands and grid of the hierarchical structure with other metal material due to the flexibility of LIL and ICP etching.
引用
收藏
页码：197 / 200
页数：4
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