Optimal Magnetic Graphite Heater Design for Impurity Control in Single-Crystal Si Grower Using Crystal Growth Simulation

被引:0
|
作者
Jeon, Hye Jun [1 ,2 ]
Park, Hyeonwook [1 ]
Alhammadi, Salh [1 ]
Jung, Jae Hak [1 ]
Kim, Woo Kyoung [1 ]
机构
[1] Yeungnam Univ, Sch Chem Engn, Gyongsan 38541, South Korea
[2] S TECH Co Ltd, R&D Team, Daegu 42921, South Korea
基金
新加坡国家研究基金会;
关键词
single crystal silicon; arbitrary magnetic device; impurity; graphite heater; crystal growth furnace; crystal growth simulation; NUMERICAL-SIMULATION; CZOCHRALSKI GROWTH; MELT FLOW; OXYGEN; FIELD; VACANCY; IMPACT;
D O I
10.3390/pr10010070
中图分类号
TQ [化学工业];
学科分类号
0817 ;
摘要
In this paper, we report a successfully modified single-crystal Si growth furnace for impurity control. Four types of arbitrary magnetic heater (AMGH) systems with 3, 4, 5, and poly parts were designed in a coil shape and analyzed using crystal growth simulation. The concentration of oxygen impurities in single-crystal Si ingots was compared among the designed AMGHs and a normal graphite heater (NGH). The designed AMGHs were confirmed to be able to control turbulence and convection in a molten state, which created a vortex that influenced the oxygen direction near the melt-crystal interface. It was confirmed that replacing NGH with AMGHs resulted in a reduction in the average oxygen concentration at the Si melt-crystal interface by approximately 4.8%.
引用
收藏
页数:18
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