Low-Loss Waveguides by Planar Modified Chemical Vapor Deposition

被引：3

作者：

Yevnin, Maya ^{[1
]}

Atar, Gil ^{[1
]}

Campelj, Stanislav ^{[2
]}

Lenardic, Borut ^{[2
]}

Kaplan, Natan ^{[3
]}

Sherman, Valery ^{[3
]}

Gvishi, Raz ^{[1
]}

Sfez, Bruno ^{[1
]}

Eger, David ^{[4
]}

机构：

[1] Soreq NRC, Div Appl Phys, IL-8180000 Yavne, Israel

[2] Optacore DOO, Div Res & Dev, Ljubljana 1000, Slovenia

[3] Holo Or Ltd, Div Res & Dev, IL-7403617 Ness Ziona, Israel

[4] Weizmann Inst Sci, Dept Phys Complex Syst, IL-7610001 Rehovot, Israel

来源：

JOURNAL OF LIGHTWAVE TECHNOLOGY | 2020年 / 38卷 / 04期

关键词：

Germanium doped silica; optical waveguides; propagation losses; LASERS; FABRICATION; DESIGN; FIBER;

D O I：

10.1109/JLT.2019.2943494

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

We present a novel method to fabricate planar photonic devices for high power applications using modified chemical vapor deposition (MCVD) technology. The MCVD process, usually applied to optic fibers, is used here to deposit a layer of Ge doped silica on a fused silica slab. The doped layer was then heat-treated by a CO2 laser in order to achieve high optical quality and increase its damage threshold. Finally, direct laser lithography, followed by deep dry etching, was used to shape straight and curved large-core air-cladded waveguides with smooth sidewalls. The straight waveguides were shown to have an excellent propagation loss, 0.33 dB/cm, and the curved waveguide had a propagation loss of 1 dB/cm.

引用

页码：792 / 796

页数：5

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