Formation and characterization of composite Ni/BN and Ni/SiC films

被引:0
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作者
Hepel, M [1 ]
Tannahill, T [1 ]
Baxter, C [1 ]
Mahoney, C [1 ]
机构
[1] Clarkson Univ, Dept Chem, Potsdam, NY 13676 USA
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D O I
暂无
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
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页码:1059 / 1062
页数:4
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