Surface roughness of PbZrxTi1-xO3 thin films produced by pulsed laser ablation-deposition

被引:3
|
作者
Dat, R [1 ]
Auciello, O [1 ]
Kingon, AI [1 ]
机构
[1] MCNC, ELECT TECHNOL DIV, RES TRIANGLE PK, NC 27709 USA
关键词
atomic force microscopy (AFM); deposition process; laser ablation; surface roughness;
D O I
10.1016/0040-6090(95)08518-1
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The surface roughness of PbZrxTi1-xO3 (PZT) produced by pulsed laser ablation-deposition (PLAD) was evaluated as a function of the deposition temperature, oxygen pressure, laser energy density and target-to-substrate distance. Quantitative and qualitative results were obtained by scanning the surface of PZT with an atomic force microscope. The normalized root-mean-square roughness decreases as the magnitudes of the four process variables are increased. The improvement in the surface roughness with an increase in all the process parameters, except the laser energy density, can be explained qualitatively in terms of the particle energetics required for surface activation to occur. The decrease in roughness with increasing laser energy density implies that partially dissociated ejecta are completely vaporized as the laser energy density is increased.
引用
收藏
页码:45 / 48
页数:4
相关论文
共 50 条
  • [31] Theoretical investigation of polarization scaling in ultrathin epitaxial PbZrxTi1-xO3 films
    Qiu, Q. Y.
    Nagarajan, V.
    JOURNAL OF APPLIED PHYSICS, 2007, 102 (10)
  • [32] INTERACTION OF PBZRXTI1-XO3 (PZT) WITH NI - ROLE OF SURFACE-DEFECTS
    MUKHOPADHYAY, SM
    CHEN, TCS
    JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1995, 28 (10) : 2170 - 2175
  • [33] TRANSMISSION ELECTRON MICROSCOPY STUDY OF PbTiO3 AND PbZrxTi1-xO3 FILMS
    De Veirman, A. E. M.
    Staals, A. A.
    Klee, M.
    Larsen, P. K.
    FERROELECTRICS, 1996, 184 : 51 - 59
  • [34] Pulsed laser ablation and deposition of thin films
    Catherinot, A
    Champeaux, C
    Angleraud, B
    Marchet, P
    VIDE-SCIENCE TECHNIQUE ET APPLICATIONS, 1998, 53 (287): : 284 - 302
  • [35] Pulsed laser ablation and deposition of thin films
    Ashfold, MNR
    Claeyssens, F
    Fuge, GM
    Henley, SJ
    CHEMICAL SOCIETY REVIEWS, 2004, 33 (01) : 23 - 31
  • [36] Atomic layer deposition of PbTiO3 and PbZrxTi1-xO3 films using metal alkyl and alkylamide precursors
    Sbrockey, Nick M.
    Tompa, Gary S.
    Lavelle, Robert
    Trumbull, Kathleen A.
    Fanton, Mark A.
    Snyder, David W.
    Polcawich, Ronald G.
    Potrepka, Daniel M.
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2018, 36 (03):
  • [37] Structural evolution of PZTN thin films produced by pulsed laser ablation deposition
    Pereira, M.
    Gomes, M. J. M.
    VACUUM, 2008, 82 (12) : 1375 - 1378
  • [38] Impedance spectroscopy of multiferroic PbZrxTi1-xO3/CoFe2O4 layered thin films
    Ortega, N.
    Kumar, Ashok
    Bhattacharya, P.
    Majumder, S. B.
    Katiyar, R. S.
    PHYSICAL REVIEW B, 2008, 77 (01)
  • [40] Effect of Zr Content on Formation and Optical Properties of the Layered PbZrxTi1-xO3 Films
    许阳阳
    王宇
    刘爱云
    石旺舟
    胡古今
    李世民
    邓惠勇
    戴宁
    Chinese Physics Letters, 2020, 37 (02) : 55 - 58