共 50 条
- [21] Formation of 1.7-nm-thick-EOT Germanium Dioxide Film with a High-Quality Interface Using a Direct Neutral Beam Oxidation Process SIGE, GE, AND RELATED COMPOUNDS 5: MATERIALS, PROCESSING, AND DEVICES, 2012, 50 (09): : 1085 - 1090
- [22] Using process control techniques to reduce cost and improve quality of thick film printing screens 1996 INTERNATIONAL SYMPOSIUM ON MICROELECTRONICS, 1996, 2920 : 585 - 593
- [23] FABRICATION OF 16-BIT DAC USING INFRARED FIRED THICK-FILM PROCESS IEEE TRANSACTIONS ON COMPONENTS HYBRIDS AND MANUFACTURING TECHNOLOGY, 1987, 10 (03): : 364 - 369
- [24] 3-dimensional circuit device fabrication process using stereolithography and direct writing International Journal of Precision Engineering and Manufacturing, 2015, 16 : 1361 - 1367
- [29] Formation of Si and Ge films and micropatterns by wet process using laser direct writing method LASER-BASED MICRO- AND NANOPACKAGING AND ASSEMBLY V, 2011, 7921