The role of ion-assisted deposition in PVD - art. no. 698420

被引：0
|
作者：
Ma, Z. Q. [1 ]
Feng, C. B. [1 ]
Tang, X. [1 ]
Li, F. [1 ]
He, B. [1 ]
Shi, B. B. [1 ]
机构：
[1] Shanghai Univ, Dept Phys, SHU SOENs R&D Lab, Shanghai 200444, Peoples R China
来源：
THIN FILM PHYSICS AND APPLICATIONS, SIXTH INTERNATIONAL CONFERENCE | 2008年 / 6984卷
关键词：
ion-assisted deposition; surface morphology; texture modeling;
D O I：
10.1117/12.792012
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
An optimal energy interval in ion-assisted deposition of high crystalline films is predicted in the modeling of ion impacting on surface. The result is in good agreement with the presented experiments. The possible application of the evaluation of ion role for the fabrication of potential thin film materials is expected.
引用
收藏
页码：98420 / 98420
页数：4
相关论文
共 50 条
  • [41] Ion-assisted deposition of aluminum nitride on the fluorozirconate glass surface
    Dai, Yisheng
    Kawaguchi, Toshiyasu
    Osuka, Takuo
    Tada, Masashi
    Susuki, Koichi
    Masui, Akio
    Japanese Journal of Applied Physics, Part 2: Letters, 1991, 30 (7 B):
  • [42] ION-ASSISTED DEPOSITION IN UNBALANCED-MAGNETRON SPUTTERING SYSTEMS
    SPROUL, WD
    MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING, 1993, 163 (02): : 187 - 192
  • [43] Microstructure of indium oxide films in oxygen ion-assisted deposition
    Cho, JS
    Yoon, KH
    Koh, SK
    THIN SOLID FILMS, 2000, 368 (01) : 111 - 115
  • [44] THE MODIFICATION OF ALLOYS BY LOW-ENERGY ION-ASSISTED DEPOSITION
    COLLIGON, JS
    KHEYRANDISH, H
    CARTER, G
    SIMMONDS, MC
    VACUUM, 1995, 46 (8-10) : 919 - 922
  • [45] A SIMULATION STUDY OF INTERFACE MIXING DURING ION-ASSISTED DEPOSITION
    LI, WZ
    CUI, RZ
    LIAO, Y
    LI, HD
    VACUUM, 1990, 40 (03) : 289 - 292
  • [46] Radiation hardness of DLC films produced by ion-assisted deposition
    Prawer, S
    Ran, B
    Kalish, R
    Johnston, C
    Chalker, P
    Bull, SJ
    McCabe, A
    Jones, AM
    DIAMOND AND RELATED MATERIALS, 1996, 5 (3-5) : 405 - 409
  • [47] GAS INCORPORATION DURING ION-ASSISTED DEPOSITION IN BIAS SPUTTERING
    WINDOW, B
    HARDING, GL
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1993, 11 (04): : 1447 - 1450
  • [48] ION-ASSISTED SPUTTER-DEPOSITION OF MOLYBDENUM SILICON MULTILAYERS
    VERNON, SP
    STEARNS, DG
    ROSEN, RS
    APPLIED OPTICS, 1993, 32 (34): : 6969 - 6974
  • [49] The growth of tin oxide films by reactive ion-assisted deposition
    Choi, WK
    Cho, JS
    Jang, HG
    Jung, HJ
    Koh, SK
    APPLICATION OF ACCELERATORS IN RESEARCH AND INDUSTRY - PROCEEDINGS OF THE FOURTEENTH INTERNATIONAL CONFERENCE, PTS 1 AND 2, 1997, (392): : 997 - 1000
  • [50] Surface polymerization by ion-assisted deposition for polythiophene film growth
    Tepavcevic, S
    Choi, Y
    Hanley, L
    JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 2003, 125 (09) : 2396 - 2397
12345