The role of ion-assisted deposition in PVD - art. no. 698420

被引：0
|
作者：
Ma, Z. Q. [1 ]
Feng, C. B. [1 ]
Tang, X. [1 ]
Li, F. [1 ]
He, B. [1 ]
Shi, B. B. [1 ]
机构：
[1] Shanghai Univ, Dept Phys, SHU SOENs R&D Lab, Shanghai 200444, Peoples R China
来源：
THIN FILM PHYSICS AND APPLICATIONS, SIXTH INTERNATIONAL CONFERENCE | 2008年 / 6984卷
关键词：
ion-assisted deposition; surface morphology; texture modeling;
D O I：
10.1117/12.792012
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
An optimal energy interval in ion-assisted deposition of high crystalline films is predicted in the modeling of ion impacting on surface. The result is in good agreement with the presented experiments. The possible application of the evaluation of ion role for the fabrication of potential thin film materials is expected.
引用
收藏
页码：98420 / 98420
页数：4
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