Low resistivity and near-zero temperature drift ZrB2-Ag composite films prepared by DC magnetron co-sputtering

被引:5
|
作者
Tian, Guangke [1 ]
Shi, Tingting [1 ]
Li, Xinyu [1 ]
Lu, Xubin [2 ]
Wang, Yanyan [3 ]
Liu, Chao [4 ]
机构
[1] Lanzhou Jiaotong Univ, Natl Engn Res Ctr Technol & Equipment Green Coati, Lanzhou 730070, Peoples R China
[2] Lanzhou Jiaotong Univ, Sch Mat Sci & Engn, Lanzhou 730070, Peoples R China
[3] Beijing Inst Petrochem Technol, Coll New Mat & Chem Engn, Beijing 102617, Peoples R China
[4] Chinese Acad Sci, Inst Semicond, Key Lab Semicond Mat Sci, Beijing 100083, Peoples R China
基金
中国国家自然科学基金;
关键词
Thin films; Electronic materials; ZrB2-Ag composite film; Magnetron sputtering; Near-zero temperature coefficient of resistivity;
D O I
10.1016/j.matlet.2021.130992
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Nanocrystalline ZrB2-Ag composite films, which utilize Ag nanoparticles as embedded ions, were directly fabricated via the direct current magnetron co-sputtering technique. Keithley Hall Measuring Instrument allowed insight into the physical features in the temperature of 77 K to 373 K. Ag-containing composite film led to resistivity for composite films descended exponentially rather than linearly, however also resulting in the temperature coefficient of resistivity (TCR) values varied from negative to positive. Both comparable lower resistivity (114.9 mu S2 center dot cm) and even near-zero TCR77-373 K at 3 ppm center dot K-1 indicated that low resistivity and nearzero temperature drift ZrB2-Ag composite film can be obtained by tailoring the Ag content. Moreover, this provides a promising approach to develop sophisticated thin-film resistors (TFR) materials below and above ambient temperature with a broader temperature range.
引用
收藏
页数:3
相关论文
共 50 条
  • [11] Fabrication and resistivity of ZnO:Al thin films prepared by DC magnetron sputtering at room temperature
    Ren, Mingfang
    Wang, Hua
    Xu, Jiwen
    Yang, Ling
    Taiyangneng Xuebao/Acta Energiae Solaris Sinica, 2009, 30 (03): : 344 - 347
  • [12] Influence of substrate temperature on the properties of ZnTe:Cu films prepared by a magnetron co-sputtering method
    Hongwei Li
    Haofei Huang
    Azhati Lina
    Ke Tang
    Zhuorui Chen
    Zilong Zhang
    Ke Xu
    Keke Ding
    Linjun Wang
    Jian Huang
    HELIYON, 2024, 10 (01)
  • [13] Hard nanocomposite Ti-Cu-N films prepared by dc reactive magnetron co-sputtering
    Li, ZG
    Miyake, S
    Kumagai, M
    Saito, H
    Muramatsu, Y
    SURFACE & COATINGS TECHNOLOGY, 2004, 183 (01): : 62 - 68
  • [14] Characterization studies of heavily doped Ag-SnS thin films prepared by magnetron co-sputtering technique
    Baby, Benjamin Hudson
    Mohan, D. Bharathi
    MATERIALS TODAY-PROCEEDINGS, 2020, 26 : 108 - 113
  • [15] Structural and optical properties of Zn-doped SnO2 films prepared by DC and RF magnetron co-sputtering
    Xu, Bo
    Ren, Xiao-Guang
    Gu, Guang-Rui
    Lan, Lei-Lei
    Wu, Bao-Jia
    SUPERLATTICES AND MICROSTRUCTURES, 2016, 89 : 34 - 42
  • [16] Fabrication and Characterization of Co-Sputtering Au/SiO2 Thin Films Prepared by RE Magnetron Sputtering
    Aspanut, Z.
    Wah, C. K.
    Kong, C. S.
    Ritikos, R.
    Tong, G. B.
    Rahman, S. A.
    Muhammad, M. R.
    INEC: 2010 3RD INTERNATIONAL NANOELECTRONICS CONFERENCE, VOLS 1 AND 2, 2010, : 970 - 971
  • [17] Controllable phase structure and mechanical properties of ZrB2-NbN nanocomposite films by magnetron co-sputtering
    Li, Chun
    Dong, Lei
    Wan, Rongxin
    Gu, Hanqing
    Li, Dejun
    MATERIALS EXPRESS, 2016, 6 (06) : 493 - 500
  • [18] Mechanical and Tribological Properties of Ag/TiBx Nanocomposite Thin Films with Strong Antibacterial Effect Prepared by Magnetron Co-Sputtering
    Vidis, Marek
    Truchly, Martin
    Izai, Vitalii
    Fiantok, Tomas
    Rajninec, Miroslav
    Roch, Tomas
    Satrapinskyy, Leonid
    Harsani, Marian
    Nagy, Stefan
    Turinicova, Veronika
    Mikula, Marian
    COATINGS, 2023, 13 (06)
  • [19] Transparent conductive ZnO:Ga films prepared by DC reactive magnetron sputtering at low temperature
    Bie, X.
    Lu, J. G.
    Gong, L.
    Lin, L.
    Zhao, B. H.
    Ye, Z. Z.
    APPLIED SURFACE SCIENCE, 2009, 256 (01) : 289 - 293
  • [20] Photocatalytic properties of Au/TiO2 thin films prepared by RF magnetron co-sputtering
    Jung, Jong Min
    Wang, Mingsong
    Kim, Eui Jung
    Hahn, Sung Hong
    VACUUM, 2008, 82 (08) : 827 - 832